Providing ultra-trace metals analysis by high resolution inductively coupled plasma mass spectometry with sensitivity for materials and process development
Often, the preferred measurement choice for trace metals analysis is Inductively Coupled Plasma (ICP) coupled with optical emission detection (ICP-OES). In cases when ultra-trace quantification is desired (in the part-per-trillion range), ICP-OES cannot provide the necessary sensitivity and ICP with Mass Spectrometry (MS) detection is needed. However, traditional quadrapole based ICP-MS measurements can suffer from spectral interferences which result in complicated or even incorrect measurements.
To combat these issues, Intertek utilizes High Resolution-ICPMS, or magnetic sector ICPMS, to detect, identify and quantify analytes of interest without these limitations. This high-end analysis capability provides a means of definitively measuring ultra-trace metals content in a variety of materials where understanding ultra-trace metals contamination is important.
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