High Resolution ICP-MS Ultra-Trace Metals Analysis
Providing ultra-trace metals analysis by high resolution inductively coupled plasma mass spectometry across multiple industries with sensitivity to support materials and process development.
Often, the preferred measurement choice for trace metals analysis is ICP coupled with optical emission detection (ICP-OES). In cases when ultra-trace quantification is desired (in the part-per-trillion range), ICP-OES cannot provide the necessary sensitivity and ICP with mass spectral (MS) detection is needed. However, traditional quadrapole based ICPMS measurements can suffer from spectral interferences which result in complicated or even incorrect measurements.
To combat these issues, Intertek utilizes HR-ICPMS, or magnetic sector ICPMS, to detect, identify and quantify analytes of interest without these limitations. This high-end analysis capability provides a means of definitively measuring ultra-trace metals content in a variety of materials where understanding ultra-trace metals contamination is important.
Applications:
- Evaluation of purity for ‘ultra-pure’ or semiconductor grade process chemicals
- Screening of residual metals in manufactured plastics such as organic electronics, medical devices
- Measurement of ultra-trace heavy metals (eg. Cr, Cd, Sb, Pb) in consumer and beauty products
- Catalyst poisoning
- Investigating contamination issues related to sub parts-per-trillion levels in complex matrices
Attributes
- Multi-element analysis across the periodic table
- Detection limits down to sub parts-per-trillion for select matrices
- Sample types include aqueous and organic solutions, solids, and gases
- Experiments carried out in a clean-room to minimize environmental contamination
Related Services:
Contact us to see how Intertek can help your organization with High Resolution ICP-MS Ultra-Trace Metals Analysis.